ELMO 780 XHP
Femtosecond Erbium Laser
Specifications
Advanced Features and Benefits
- Output power >1 W at 780 nm
- Pulse width <150 fs at 780 nm
- Integrated fast amplitude modulation
- Integrated dispersion precompensation up to -30.000 fs²
- Optional output port delivering >1 W at 1560 nm
Model | ELMO 780 XHP |
Contained Modules* | 19“ control unit, compact laser head |
Output characteristics 780 nm | |
Central Wavelength | 780 nm ± 10 nm |
Average Power | >1 W (typ. 1.2 W) |
Pulse Width | <150 fs (typ. 120 fs) |
Repetition Rate | 100 MHz ± 1 MHz |
Output Port | free space |
Beam Quality | M2 <1.2 |
Polarization | linear, s-polarized |
Dispersion Precompensation | up to -30.000 fs2 |
Fast Amplitude Modulation** | integrated AOM for fast light modulation |
Options | |
1560 nm Output Port | free space, >1 W |
Multiple Output Ports | please inquire for additional oscillator/amplifier output ports |
*Control unit and laser head permanently interconnected by umbilical cord.
**Analog input 0 - 5 V, rise-/fall-time <300 ns (typ. 180 ns)
Description
The most recent high power extension of our industry-proven ELMO series: ELMO 780 XHP delivers up to 1.5 W of average output power at 780 nm, with pulse durations down to 100 fs. An additional output port providing >1 W at the 1560 nm fundamental is readily available. ELMO 780 XHP comes in an extremely compact design, requiring just a fraction of space occupied by other lasers with comparable performance. Fully integrated fast amplitude modulation and dispersion precompensation make ELMO 780 XHP a perfect fit for multi-photon applications in microscopy or 3D nanoprinting.
Applications
- 放大器种子注入
- 太赫兹生产与太赫兹物理学
- 双光子聚合和3D打印
- Multiphoton Microscopy
- Ultrafast Spectroscopy
- Multi-Photon Excitation
Application Notes
-
Dr. Jaroslaw Sperling
Your direct line to our expert
Data sheets
Product literature
Ordering information
- Product Code
- ELMO 780 XHP
Headquarters
sales@menlosystems.com
+49 89 189166 0
Menlo Systems, Inc.
ussales@menlosystems.com
+1 973 300 4490